Model Reduction for a Tungsten Chemical Vapor Deposition System
نویسندگان
چکیده
منابع مشابه
Model Reduction for a Tungsten Chemical Vapor Deposition
A model of a tungsten chemical vapor deposition (CVD) system is developed to study the CVD system thermal dynamics and wafer temperature nonuniformities during a processing cycle. We develop a model for heat transfer in the system’s wafer/susceptor/guard ring assembly and discretize the modeling equation with a multiple-grid, nonlinear collocation technique. This weighted residual method is bas...
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ژورنال
عنوان ژورنال: IFAC Proceedings Volumes
سال: 1998
ISSN: 1474-6670
DOI: 10.1016/s1474-6670(17)44903-2